Fabrication and electrical, electrochemical characteristics of copper chloride-doped graphene films
Keywords:
CuCl-doped graphene film, electrical, electrochemical.Abstract
In this study, the thin films of graphene (Gr) doped with copper (I) chloride (CuCl) were fabricated on a
copper (Cu) substrate by chemical vapour deposition method at 1000oC in a mixture of gases (Ar, H2
, and CH4) combined with annealing method at 220oC to vapourise CuCl powder. The morphology, structure,
electrical, and electrochemical characteristics of the CuCl-doped Gr films (CuCl-Gr) were investigated via
field emission scanning electron microscopy (FESEM), Raman spectroscopy, four-probe method and cyclic
voltammetry. The results of Raman spectroscopy showed that there is a shift of the characteristic peaks (D, G
and 2D) toward higher frequencies of the CuCl-Gr film compared to the pristine Gr film. The surface resistance
measurement results exhibited that the CuCl-Gr film has a surface resistance of about 452 ohm/square (Ω/□),
2.02 times lower than that of the Gr film (913 Ω/□). The electrochemical characteristic measurement results in 3 mM Fe(CN)63-/4- with 0.1 M PBS proved that the peak response current of the gold electrode (AuE) coated with CuCl-Gr film is 21.2 µA, 1.6 times higher than that of the AuE coated with Gr. These research results showed a great potential of using CuCl-Gr film to cover the surface of working electrodes in increasing the conductivity and sensitivity of electrochemical sensors.
DOI:
https://doi.org/10.31276/VJST.65(3).07-11Classification number
1.3
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Published
Received 8 October 2021; accepted 5 November 2021

